Method of wafer dicing for wafers with backside metallization and packaged dies

ABSTRACT

A method of wafer dicing includes singulating dies from a semiconductor wafer. The method further includes depositing a metal layer on back sides of the singulated dies, wherein a portion of the metal layer continues beyond the backs sides of the singulated dies to deposit at least partially on lateral sides of the singulated dies. A packaged die includes a semiconductor die and a metal outer layer deposited on the back side of the semiconductor die and on a portion of the lateral side of the semiconductor die nearest the back side. The packaged die further includes a substrate mounted to the back side of the semiconductor die a die attach material that bonds the substrate to the metal outer layer deposited on the semiconductor die, wherein the metal outer layer and the die attach material surround the back edge of the semiconductor die.

FIELD

The present disclosure relates generally to singulating and metalizingdies and more particularly to metalizing the back sides of a pluralityof dies after singulation from a semiconductor wafer for use in packageddies.

BACKGROUND

Plasma dicing, also referred to as deep reactive ion etching, is a dryetching technology used to singulate dies from semiconductor wafers.Plasma dicing can be implemented as a parallel process to dice wholesemiconductor wafers simultaneously and therefore more quickly than alaser, for example, which gradually singulates dies using multiplepasses.

When compared with a saw singulation process, plasma dicing alsominimizes cutting kerf, leaving more of a semiconductor wafer intact,and reduces mechanical damage imparted to the edges of dies resultingfrom the singulation of the wafer. Sawing with a diamond-tipped bladecan leave a saw street roughly 85 microns wide as compared toapproximately 5 to 10 microns in width for plasma dicing. Stresses andmicrocracks caused by the mechanical interaction between the saw bladeand a semiconductor wafer can lead to failures in the resulting dieswhen they are operationally cycled in power and temperature. Edge damagefrom sawing is increasingly likely with thin dies having a thickness of50 microns or less. Even absent sawing, damage to a die edge can occurafter singulation from routine handling.

Particular dies benefit from being manufactured with a metal backing. Ametal back layer ads strength to thin dies and also providesadvantageous thermal, electronic, and electromagnetic (EM) properties. Ametal backing can operate as a heat sink for a power chip, as a commonground for a chip's multiple electronic components, or excite certain EMwave propagation modes for a radio frequency (RF) chip.

The standard method of providing a metal backing on dies is to deposit ametal layer on the back side of a semiconductor wafer before singulatingdies from the wafer.

Singulation is typically carried out via sawing. While plasma dicing ispreferable for singulating semiconductor wafers, the dry etchingtechnology is incompatible with metal.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying figures, where like reference numerals refer toidentical or functionally similar elements throughout the separateviews, together with the detailed description below, are incorporated inand form part of the specification, and serve to further illustrateembodiments of concepts that include the claimed invention, and explainvarious principles and advantages of those embodiments.

FIG. 1 shows a cross-sectional view illustrating relevant parts of asingulated semiconductor die, in accordance with described embodiments.

FIG. 2 shows a logical flow diagram illustrating a method forsingulating and metalizing dies, in accordance with some embodiments.

FIG. 3 shows a sequence of cross-sectional views illustrating dies beingsingulated and metalized, in accordance with some embodiments.

FIG. 4 shows a set of cross-sectional views illustrating adjustmentparameters for control over metal deposition after singulation, inaccordance with some embodiments.

FIG. 5 shows a cross-sectional view of a packaged die, in accordancewith some embodiments.

FIG. 6 shows a logical flow diagram illustrating a method forsingulating and metalizing dies, in accordance with some embodiments.

FIG. 7 shows a sequence of cross-sectional views illustrating dies beingsingulated and metalized, in accordance with some embodiments.

FIG. 8 shows a logical flow diagram illustrating a method for metalizingand singulating dies, in accordance with some embodiments.

FIG. 9 shows a sequence of cross-sectional views illustrating dies beingmetalized and singulated, in accordance with some embodiments.

The present disclosure is illustrated in part with examples, asreflected by disclosed embodiments, and is not limited by theaccompanying figures, in which like reference numbers indicate similarelements. Skilled artisans will appreciate that elements in the figuresare illustrated for simplicity and clarity and have not necessarily beendrawn to scale. For example, the dimensions of some of the elements inthe figures may be exaggerated relative to the dimensions of otherelements to help to improve understanding of embodiments implicitly orexplicitly disclosed herein.

The apparatus and method components have been represented, whereappropriate, by conventional symbols in the drawings, showing only thosespecific details that are pertinent to understanding the embodiments ofthe present disclosure so as not to obscure the disclosure with detailsthat will be readily apparent to those of ordinary skill in the arthaving the benefit of the description herein. Also, the operationsincluded in the flow diagrams do not imply a required order inperforming the functionality contained therein.

DETAILED DESCRIPTION

Described embodiments allow for semiconductor wafer singulation usingplasma dicing, also referred to as plasma etching, when singulated diesare to have a metal backing, such as in the case of dicing RF powerwafers. Additional embodiments are directed to creating a packaged diewhereby an edge of a singulated die having a metal backing is connectedto a substrate with a die attachment material.

In accordance with one embodiment, a method of wafer dicing for backsidemetalization includes singulating dies from a semiconductor wafer,wherein each singulated die has a back side opposite a front side andadjacent to a lateral side. The back and front sides of the diescorrespond to opposing back and front sides of the semiconductor wafer.The method further includes depositing a metal outer layer on the backsides of the singulated dies, wherein a portion of the metal outer layercontinues beyond the backs sides of the singulated dies to deposit atleast partially on the lateral sides of the singulated dies.

In accordance with another embodiment is a packaged die with asemiconductor die having a front side opposite a back side, a lateralside adjacent to the front and back sides, and a back edge where theback and lateral sides meet. The packaged die also includes a metalouter later deposited on the back side of the semiconductor die and on aportion of the lateral side of the semiconductor die nearest the backside. For a particular embodiment, the packaged die further includes asubstrate (e.g., a conductive flange) mounted to the back side of thesemiconductor die and a die attach material that bonds the substrate tothe metal outer layer deposited on the semiconductor die, wherein themetal outer layer and the die attach material may surround the back edgeof the semiconductor die.

A semiconductor wafer is also referred to as simply a wafer. Similarly,the words “semiconductor die,” “singulated die,” and “die” are usedinterchangeably herein. A wafer, and by extension, a die, can be made ofany semiconductor material or combination of materials. Such materialsinclude, but are not limited to, gallium nitride, gallium arsenide,silicon germanium, silicon-on-insulator (SOI), and monocrystalline orother forms of silicon.

Referring now to the drawings, FIG. 1 shows a cross-sectionalrepresentation of a singulated die 142 and portions thereof relevant indescribing presented embodiments. The singulated die 142 includes a basesemiconductor substrate 120 and a plurality of conductive and insulativebuild up layers 122 overlying a surface of the base semiconductorsubstrate 120. A front side 102 of the die 142 is the active side of thedie, and the front side 102 of the die 142 corresponds to an exteriorsurface of an outermost one of the build up layers 122. The active sideincludes integrated circuit components, which are active when the die142 is powered. A back side 110 of the die 142 is opposite the frontside 102, and the back side 110 of the die 142 corresponds to anexterior surface of the base semiconductor substrate 120. A distancebetween the front 102 and back 110 sides of the die 142 represents itsthickness 114. Similarly, a thickness of a wafer is the distance betweena front side and a back side of a wafer from which the die 142 wassingulated, where the front side of the wafer, being the active side ofthe wafer, is opposite the back side of the wafer.

Adjacent to the both the front 102 and back 110 sides of the die 142 isa lateral side 106 of the die 142, which runs parallel or approximatelyparallel to the thickness 114 of the die 114. Unless expressly statedotherwise, the lateral side of a die as written in the singular isunderstood to include a plurality of lateral sides. The lateral side ofa die having rectangular front and back sides, for example, can refer toone, two, three, or all four lateral sides in any combination. A width112 of the die 142 is shown as the distance across the back side 110 ofthe die 142. In some instances, a die will have different measuredwidths, depending on if the measurement is taken at a back side or afront side of the die, for example, if the die has a non-verticallateral profile, and/or if the measurement is side-to-side,corner-to-corner, or side-to corner.

A front edge 104 of the die 142 is defined by the intersection of thefront side 102 with the lateral side 106. Analogously, a back edge 108of the die 142 is defined by the intersection of the back side 110 withthe lateral side 106. Where the back 110 side of the die 142 ischaracterized by a square, for example, the back edge 108 of the die 142is the perimeter of the square. Unless expressly stated otherwise, thefront edge 104 or back edge 108 of a die as written in the singular isunderstood to include a plurality of edges. The front edge of a diehaving a rectangular front side, for example, can refer to one, two,three, or all four front edges in any combination.

FIG. 2 shows a method 200, illustrated as a logical flow diagram, forsingulating dies by dicing post grinding (DPG) prior to depositing ametal outer layer on the back sides of the singulated dies. The method200 is described with reference to FIG. 3, which includes fivecorresponding cross-sectional views 310, 320, 330, 340, 350. Inparticular, FIG. 3 shows a thinned semiconductor wafer 312, a mask 314,a temporary carrier 332, singulated dies 342, a deposited metal outerlayer 352, and a transport carrier 362.

The method 200 begins with attaching 202 a front side of thesemiconductor wafer 312 to the temporary carrier 332, as shown in view310. Before dicing, the wafer 312 is thinned to a thickness of betweenabout 15 and about 100 micrometers, although the thinned wafer 312 maybe thinner or thicker than this range, as well. In a particularembodiment, the wafer is thinned to approximately 50 micrometers. Thetemporary carrier 332 to which the thinned wafer 312 is attached holdsand supports the wafer 312 as the wafer 312 is diced into the singulateddies 342, as described below. The temporary carrier 332 additionallyprotects the front side of the wafer 312 from damage during thesingulation process and masks the front sides of the singulated dies 342during metalization. Further, the temporary carrier 332 preservesrelative positions between the singulated dies 342 so those dies 342falling short of quality control standards can be tracked and laterseparated to prevent their use.

In some embodiments, the temporary carrier 332 is made from a rigidmaterial to better hold, support, protect, and preserve the relativepositions of the singulated dies 342. In a particular embodiment, thetemporary carrier 332 is a glass carrier. The temporary nature of thecarrier 332 is realized by using an adhesive layer and a carrier releaselayer on the attachment surface of the carrier 332 (i.e., the surfacefacing the wafer 312) that allows the carrier 332 to be removed from thefront sides of the dies 342 after singulation and metalization (e.g.,after view 340). A glass carrier, for example, passes light from alaser, where the light neutralizes the carrier release layer to releasethe glass carrier from the singulated dies 342. In other embodiments,heat and/or vibrations, such as ultrasonic vibrations, are used torelease the temporary carrier 332 from the singulated dies 342.

After the front side of the wafer 312 is attached to the temporarycarrier 332, the method 200 continues with the application 204 of themask 314 to the back side of the thinned wafer 312, as shown in view320. The mask 314 is patterned to expose areas on the back side of thewafer 312 that are to be etched. Those areas covered by the mask 314 arenot etched, and those areas not covered by the mask 314 are etched. Forsome embodiments, lithography is used to pattern a photoresist, such asa light-sensitive polymer, on the back side of the wafer 312 to act asthe mask 314. In other embodiments, the entire back side of the wafer312 is covered by the mask 314, and portions of the mask 314 coveringareas to be etched are ablated, for example, by using a laser. In oneembodiment, a passivation layer of silicon dioxide serves as the mask314.

With the mask 314 in place, etching the thinned wafer 312 singulates 206the dies 342. For example, deep reactive ion etching (DRIE), orequivalently, plasma dicing, is the method used. In this process, ahigh-speed stream of neutral or charged particles (i.e., etch species)is incident upon areas of the thinned wafer 312 not protected by themask 314. For various embodiments, the stream of particles includesradicals which are chemically reactive and more aggressively attackareas of the wafer 312 being etched over high-speed mechanical ablationalone.

Etching the back side of the semiconductor wafer by plasma dicingcontinues until the dies 342 are completely singulated in that each ofthe dies 342 are physically dissociated from any and all neighboringdies by a kerf or die street 322, as shown in view 330. The method 200then continues with the removal 208 of the mask 314 from the back sidesof the singulated dies 342 before depositing 208 the metal outer layer352 on the back sides of the dies 342.

A metal outer layer, as used herein, is a topmost or last metal layer ofa plurality of stacked metal layers that are deposited on the backsidesof singulated dies. Gold, for example, is the metal outer layer 352where a titanium barrier layer is deposited directly over the singulateddies 342 with a nickel-vanadium alloy layer deposited over the titaniumlayer and the gold deposited as a final layer over the nickel-vanadiumlayer. This stacking of metal layers is denoted as Ti—NiV—Au. Anon-exhaustive list of other stacked metal layers consistent withembodiments described herein includes Ti—NiV—Au, Ti—NiV—Ag, Ti—Au,Ti—Ag, and Au—Ag—Au. For embodiments for which only a single metal layeris deposited over the singulated dies 342, such as when only gold isdeposited on the back sides of the dies 342, the single metal layer isthe metal outer layer 352. In different embodiments, the metal outerlayer 352 is gold (Au), silver (Ag), copper (Cu), or nickel (Ni) or anyof these metals alloyed with one another or a different metal. Forvarious embodiments, the metal outer layer 352 is between about 1.5 andabout 20 kiloangstroms (kÅ) in thickness, although the metal outer layer352 may be thinner or thicker, as well. For a particular embodiment, themetal outer 352 layer is approximately 5 kA in thickness.

The metal outer layer 352, and any metal layers underneath (notillustrated) in the case of layer stacking, are deposited on the backsides of the singulated dies 342 as shown in view 340. According to anembodiment, the metal outer layer 352 is simultaneously deposited on theback sides of the plurality of singulated dies 342 while the pluralityof singulated dies 342 are held in fixed relative positions, withrespect to each other, by the temporary carrier 332. The metal outerlayer 352 is deposited by sputtering, spin coating, chemical vapordeposition (CVD), physical vapor deposition (PVD), electroplating,conformal depositing, or any other means of depositing metal on thebacksides of the singulated dies 342. In an embodiment, a portion of themetal continues beyond the back sides of the dies 342 to deposit atleast partially on the lateral sides of the dies 342. A portion of ametal outer layer depositing at least partially on the lateral side of adie means that some of the metal outer layer extends beyond the backside of the die to deposit on an area of the lateral side of the die.The areas of the lateral sides of the singulated dies 342 on which aportion of the metal outer layer 352 is deposited is located adjacent tothe back edges of the dies 342. View 340 shows the areas of the lateralsides of the singulated dies 342 adjacent to the front edges of the dies342 are kept free from the metal outer layer 352. This is to prevent theconductive metal outer layer 352, and any metal layers stackedunderneath, from causing short circuits or other complications on theactive sides of the dies 342. In various embodiments, between 20 and 80percent of the lateral sides of the dies 342 nearest the front edges arekept free of the metal outer layer 352. In a particular embodiment,approximately 50 percent of the lateral sides of the dies 342 nearestthe front edges are kept free of the metal outer layer 352. In someembodiments in which the conductive build up layers do not extend to thelateral sides of the dies 342, the metal outer layer 352 could extend tothe front sides of the dies 342.

For some embodiments, at least one adjustment parameter controls theportion of the metal outer layer 352 that continues beyond the backssides of the singulated dies 342 to deposit partially on the lateralsides of the singulated dies 342. Turning momentarily to FIG. 4,particular adjustment parameters are described with reference to views410, 420, 430, 440, and 450. Each view shows neighboring singulated dies442 attached to a temporary carrier 432 and separated by a plasma-etchedkerf 422. In each of the views 420, 430, 440, and 450, a differentgeometry of the kerf 422, as compared to the view 410, illustrates adifferent adjustment parameter. These adjustment parameters are appliedto the singulated dies 442 independently or in any combination. Varyingthe one or more adjustment parameters provides control over the portionof the metal outer layer 352 deposited on the lateral sides of thesingulated dies 442.

A first adjustment parameter includes an aspect ratio of a distancebetween the singulated dies 442 to a thickness of the singulated dies442 when depositing the metal outer layer 352. This adjustment parameteris illustrated by comparing views 410 and 420. In both views 410, 420,the thickness of the neighboring dies 442 is the same. The distancebetween the dies 442, however, varies. As shown, a distance 474 betweenthe dies 442 in view 420 is less than a distance 472 between the dies442 in view 410. Therefore, the aspect ratio of the distance between thesingulated dies 442 to the thickness of the singulated dies 442 islowered in adjusting the kerf 422 from the distance 472 to the distance474. The smaller kerf 422 in view 420, as compared to view 410, resultsin less metal getting into the kerf 422 between the dies 442. The loweraspect ratio shown in view 420, as compared to view 410, limits thedepth to which the metal outer layer 352 deposits on the lateral sidesof the dies 442. For one embodiment, the metal outer layer deposits onapproximately two thirds of the lateral sides of the dies 442, asmeasured from the back sides of the dies 442. In an embodiment, thedistance 472, 474 defining the kerf 474 is approximately 10 microns,although distance 472, 474 may be narrower or wider, as well.

A second adjustment parameter includes a front edge curvature 476 of thefront edge of the singulated dies 442. This adjustment parameter isillustrated by view 430. In adjusting for more front edge curvature 476,as compared to view 410, more of the metal outer layer 352 beingdeposited “rolls” around the smoothed front edges to deposit on thelateral sides of the dies 442. For one embodiment, the front edgecurvature 476 represents a circular arc in that it is described by aradius. In other embodiments, the front edge curvature 476 representsany nonlinear convex profile.

For some embodiments, the at least one adjustment parameter controllingthe portion of the metal outer layer 352 that continues beyond the backssides of the singulated dies 442 to deposit partially on the lateralsides of the singulated dies 442 includes a profile of the lateral sidesof the singulated dies 442 when depositing the metal outer layer 352.This is illustrated by views 440 and 450.

In view 440, a third adjustment parameter includes a lateral slope 478of the lateral sides of the singulated dies 442. Here, the lateral sideprofile of the dies 442 is approximately linear. As shown, the lateralslope 478 is negative in that the kerf 422 increases in width from theback sides to the front sides of the neighboring dies 442. In otherembodiments, the lateral slope 478 is positive, with the width of thekerf 422 decreasing from the back sides to the front sides of theneighboring dies 442. As the lateral slope 478 decreases from a positivevalue, through zero (vertical sidewalls), to a negative value (shown), asmaller portion of the metal outer layer 352 continues beyond the backssides of the neighboring dies 442 to deposit partially on the lateralsides of the dies 442.

In view 450, a fourth adjustment parameter includes a lateral curvature480 of the lateral sides of the singulated dies 442. Here, the lateralside profile of the dies 442 is nonlinear. As shown, the lateralcurvature 480 is concave between the neighboring dies 442 with the widthof the kerf 422 increasing from the back sides to the front sides of theneighboring dies 442. In other embodiments, the lateral curvature 480can be concave or convex with the width of the kerf 422 eitherincreasing or decreasing from the back sides to the front sides of theneighboring dies 442. Concave curvature, as compared to convexcurvature, and increasing the width of the kerf 422, as compared todecreasing the width of the kerf 422, in the direction toward the frontsides of the neighboring dies 442 results in a smaller portion of themetal outer layer 352 being deposited on the lateral sides of the dies442.

For some embodiments, generating an etch profile in accordance withdescribed adjustment parameters is achieved using a Bosch process inplasma etching the kerf 422 between neighboring dies 442. A plasma steamof sulfer hexaflouride (SF₆), for example, creates an isotropic etch ofthe wafer 312. As the kerf 422 is etched vertically deeper, materialcontinues to be removed from the exposed sides of the partially formedkerf 422. Allowing this lateral etching to continue results in an etchprofile having a kerf 422 that narrows with depth. To stop the continuedlateral etching, the etching is intermittently halted to create achemically inert passivation layer on newly exposed portions of the kerf422 sidewalls. The sidewalls are exposed to octafluorocyclobutane (C₄F₈)gas, for instance, to create a hardened passivation layer that resistsfurther etching. By varying the intervals of time during which etchingoccurs before stopping to extend the passivation layer, differentlateral etching profiles are realized. Etching for increasingly extendedperiods of time before lateral passivation, for example, creates a kerf422 which increases in width in the vertical etching direction.

Returning to FIG. 2, the method 200 continues, after depositing 208 themetal outer layer 352 on the back sides of the singulated dies 342, withattaching 210 the backsides of the dies 342 to the transport carrier 362and then removing 212 the front sides of the dies 342 from the temporarycarrier 332. Attaching the transport carrier 362 to the back sides ofthe singulated dies 342 before removing the temporary carrier 332 fromthe front sides of the dies 342 preserves the relative positions of thesingulated dies 342 on the transport carrier 362. In this way,individual dies 342 may be mapped and tracked by position until a finalmounting process (e.g., a pick-and-place process) for which dies 342falling short of quality control standards are not selected. The view350 shows the temporary carrier 362 attached to the back sides of thedies 342 and the temporary carrier 332 released from the front sides ofthe dies 342. The dies 342 are rotated from a back-side-up orientationin view 340 to a back-side-down orientation in view 350.

The transport carrier 362 is a material device that secures thesingulated dies 342 in fixed relative positions for transport from alocation where the dies 342 are singulated and metalized to a locationwhere the dies 342 undergo further processing, such as being mounted ona substrate (e.g., a conductive flange) to form a packaged die. Thetransport carrier 362 allows for the dies 342 to be released whenneeded, and is in some instances made from a more economical materialthan the temporary carrier 332, which is reused after its detachment.

In one embodiment, the transport carrier 362 is an ultraviolet (UV)transparent tape. A UV-sensitive adhesive on the tape is weakened orneutralized with exposure to UV light, releasing the attached dies 342.In other embodiments, the transport carrier 362 is a ribbon or sheethaving an adhesive, or other means of attachment, by which individualdies 342 are separated from the carrier 362 under the influence of aforce. For example, individual dies 342 are removed 214 from thetransport carrier 362 using a pressure ejection method or a vacuumpickup method. In further embodiments, the application of heat and/orsimply grasping and pulling the dies 342 releases them from thetransport carrier 362, which may be flexible or rigid.

Now referencing FIG. 5, the method 200 ends with removing 214 asingulated die 542 from the transport carrier 362 and mounting 214 theback side of the die 542 to a substrate 572 (e.g., a conductive flange).The backside of the die 542 is mounted to the substrate 572 using a dieattach material 562 that bonds to a metal outer layer 552 deposited onthe backside and deposited at least partially on the lateral side of thedie 542. An assembly that includes a die with a metal outer layer joinedto a substrate is referred to herein as a packaged die. A packaged die500 results from mounting the die 542 to the substrate 572.

A substrate is an object to which the back side of a metalized die ispermanently mounted so that the substrate accompanies the die in use forthe purpose for which the die was designed. As pictured in FIG. 5, forexample, the substrate 572 is a monolithic piece of metal or metal alloywhich operates as a heat sink for the die 542, where the die 542operates as a high-power chip generating heat that needs to bedissipated. In other embodiments, the substrate 572 represents aplurality of materials with the material to which the metal outer layer552 is bonded being conductive. The substrate 572, for instance, has ametal or metal alloy ground layer over a printed circuit board (PCB)material, such as a glass-reinforced epoxy laminate sheet. The substrate572 extends beyond the dimensions of the back side of the die 542 towhich it is mounted. For some embodiments, additional dies and/orelectronic components are mounted to the substrate 572, and theconductive material of the substrate operates as a common ground for themultiple dies and/or components.

The metal outer layer 552 and the die attach material 562, as shown inFIG. 5, extend beyond the width of the back side of the die 542 so theback edge of the die 542 is encapsulated by the metal outer layer 552and the die attach material 562. Encapsulate, as used here, means tosurround and encase. The metal outer layer 552 is deposited partially onthe lateral side of the die, as shown and previously described. The dieattach material 562 bonds or adheres to the metal outer layer 552 onboth the back and lateral sides of the die 542. The resulting metalouter layer and die attach material combination is layered over the backedge of the die 542 and any back corners where the back edge abruptlychanges direction. This encapsulation, as shown in cross section,protects the otherwise exposed and relatively fragile back edge of thedie 542 from sustaining unwanted damage during further processing and/orhandling. The encapsulation also increases the efficiently of heattransfer from the die 542 through the metal outer layer 552 and dieattach material 562 to the substrate 572 during high-power applications.

For some embodiments, the die attach material 562 is a sintered metal,for example, a silver-containing or copper-containing paste which can besintered using heat and/or pressure to create a eutectic bond betweenthe metal outer layer 552 of the die 542 and the metal of the substrate572. In a particular embodiment, the metal outer layer 552 is a goldlayer and the substrate 572 is a copper flange. For differentembodiments, sintered silver or copper creates a eutectic bond between ametal outer layer 552 of gold, silver, copper, nickel or alloy thereofand a substrate 572 of gold, silver, copper, nickel or alloy thereof. Ingeneral, the die attach material 562 can be any sinter material whichcreates a eutectic bond between a metal used for the metal outer layer552 and a metal used for the substrate 574.

In other embodiments, the die attach material 562 is a conductiveadhesive. For example, the die attach material 562 is metal-containingepoxy or paste that cures to form a durable polymer which is highlyconductive and therefore allows the substrate 572 to operate togetherwith the metal outer layer 552 as a common ground. In a particularembodiment, the die attach material 562 is a silver epoxy containingsilver particles. For an alternate embodiment, the die attach material562 is solder, and a metal of the substrate 572 is soldered to the metalouter layer 552 of the die 542.

FIG. 6 shows a method 600, illustrated as a logical flow diagram, forsingulating semiconductor dies by dicing before grinding (DBG) prior todepositing a metal outer layer on the back sides of the dies. The method600 is described with reference to FIG. 7, which includes sixcorresponding cross-sectional views 710, 720, 730, 740 750, 760. Inparticular, FIG. 7 shows a semiconductor wafer 712, a mask 714, atemporary carrier 732, singulated dies 742, a deposited metal outerlayer 752, and a transport carrier 762. For various embodiments, unlessstated otherwise, characteristics of the semiconductor wafer 712, themask 714, the temporary carrier 732, the singulated dies 742, thedeposited metal outer layer 752, and the transport carrier 762 aresimilar or identical to those described for the semiconductor wafer 312,the mask 314, the temporary carrier 332, the singulated dies 342, thedeposited metal outer layer 352, and the transport carrier 362,respectively, with reference to FIGS. 2 and 3.

The method 600 begins with applying 602 the mask 714 to the front sideof the wafer 712, as shown in view 710. In various embodiments, thewafer is between about 600 and about 800 microns in thickness, althoughthe wafer may be thinner or thicker, as well. As pictured in view 710,the wafer 712 has not yet been thinned and is approximately 30 mils or762 microns thickness. The mask 714 includes openings that expose theareas on the front side of the wafer 712 that are to be plasma etched.Those areas covered by the mask 714 are not etched, and those areas notcovered by the mask 714 are etched.

The method 600 continues with plasma etching 604 streets 722 on thefront side of the wafer 712, as shown in view 720. In variousembodiments, the streets 722 are etched into the front side of the wafer712 to a depth of between about 50 and about 100 microns, although thestreets 722 may be shallower or deeper, as well. As pictured, thestreets 722 have a width of roughly 10 microns and are etched to a depthof approximately 75 microns. Here, etching the semiconductor wafer 712includes etching the front side of the wafer 712 by plasma dicing topartially singulate the dies 742. Partially singulated dies, such asshown in views 720 and 730, are dies having a front and/or back facedefined by etching a wafer but which are not fully singulated from thewafer (i.e., the streets 722 do not extend through the entire thicknessof the wafer 712).

The method 600 continues with removing 606 the mask 714 from the frontside of the wafer 712 and attaching 606 the front side of the wafer 712to the temporary carrier 732. View 730 shows the wafer 712 rotated fromits front-side-up orientation in view 720 to a front-side-downorientation. Attaching the front side of the wafer 712 to the temporarycarrier 732 protects the front side of the wafer 712 as operations onthe wafer 712 continue. The attachment is made using an adhesive,specifically, an adhesive which is removable without damaging the frontsides of the singulated dies 742. For one embodiment, a portion of theadhesive extends beyond an interface between the front side of thepartially singulated dies and the temporary carrier 732 to adhere nearthe front edge on the lateral sides 734 of the partially singulateddies.

The method 600 continues with singulating 608 the dies 742 from thewafer 712 by thinning the wafer 712 from the back side to meet theetched streets 722. A backgrinding process is used, for example, to thinthe wafer 712 down to about 50 microns, more or less. Once the wafer 712is thinned from the back side to a thickness of less than the depth ofthe streets 722 etched into the wafer's front side, the wafer 712separates into the completely singulated dies 742 shown in view 740.Coordinating the extent of the thinning process with the depth of theetching process achieves a predetermined thickness for the singulateddies 742.

Some implementations, indicated in FIG. 6 by a broken line, of themethod 600 include optionally plasma etching 610 the back sides of thesingulated dies 742 as a surface preparation treatment. Thinning thewafer 712 mechanically by backgrinding between views 730 and 740, forexample, leaves behind surface damage in the form of scratches,micro-fissures, chipped back edges, and stressed areas that weaken thedies 742. This surface damage, along with possible surface deposits, ispartially or fully removed using reactive-ion etching (RIE) with achemically reactive plasma.

After singulating 608 the dies 742, the method 600 continues withdepositing 612 the metal outer layer 752 on the back sides of the dies742 as shown in view 750 and as described for the deposition of themetal outer layer 352 on the back sides of the dies 342 in the method200 (208) with reference to view 340 and FIG. 3. According to anembodiment, the metal outer layer 752 is simultaneously deposited on theback sides of the plurality of singulated dies 742 while the pluralityof singulated dies 742 are held in fixed relative positions, withrespect to each other, by the temporary carrier 732. For an embodimentpreviously described with reference to view 730, a portion of theadhesive between the wafer 712 and the temporary carrier 732 partiallyadhered to the lateral sides 734 of the partially singulated dies. Theadhesive at 734 operates to prevent the metal back layer 752 fromdepositing near the front side of the dies 742. In one instance, themetal outer layer 752 does not adhere to the adhesive. In anotherinstance, any portion of the metal outer layer that does adhere to theadhesive is removed with the adhesive when the temporary carrier 732 isremoved from the front sides of the dies 742.

Attaching 614 the transport carrier 762 to the back sides of thesingulated dies 742 and removing 616 the temporary carrier 732 from thefront sides of the singulated dies 742, illustrated in view 760,proceeds as described for the method 200 (210, 212) with the transportcarrier 362, the dies 342, the temporary carrier 332, and reference toview 350. Similarly, removing 618 a singulated die 742 from thetransport carrier 762 and mounting 618 the back side of the die 742 to asubstrate proceeds as described for the method 200 (214) with referenceto FIG. 5.

FIG. 8 shows a method 800, illustrated as a logical flow diagram, forsingulating dies using DRIE by dicing post grinding (DPG) afterdepositing a metal outer layer on the back side of a wafer. The method800 is described with reference to FIG. 9, which includes sixcorresponding cross-sectional views 910, 920, 930, 940, 950, 960. Inparticular, FIG. 9 shows a thinned semiconductor wafer 912, a mask 914,a temporary carrier 932, singulated dies 942, a deposited metal outerlayer 952, and a transport carrier 962. For various embodiments, unlessstated otherwise, characteristics of the thinned semiconductor wafer912, the mask 914, the temporary carrier 932, the singulated dies 942,the deposited metal outer layer 952, and the transport carrier 962 aresimilar or identical to those described for the semiconductor wafer 312,the mask 314, the temporary carrier 332, the singulated dies 342, thedeposited metal outer layer 352, and the transport carrier 362,respectively, with reference to FIGS. 2 and 3.

The method 800 begins with attaching 802 the front side of thesemiconductor wafer 912 to the temporary carrier 932, as shown in view910 and as described for the method 200 (202) with reference to view310. The method 800 continues with depositing 804 the metal outer layer952 on the back side of the thinned semiconductor wafer 912. The metalouter layer 952 is deposited on the back side of the semiconductor wafer912 as shown in view 920 and as described for the method 200 (208) withthe exceptions that the metal outer layer 952, and any stacked metallayers underneath, are deposited before the application of the mask 914and no portion of the metal outer layer 952 deposits on the lateralsides of the dies 942, which are not yet singulated.

The application 806 of the mask 914 to the back side of the wafer 912 todefine the location of streets 922 occurs over the previously depositedmetal outer layer 952, as shown in view 930. The portion of the metalouter layer 952 left exposed over the semiconductor material of thewafer 912 does not lend itself to removal by plasma dicing. Therefore,as illustrated in view 940, the exposed portions of the metal outerlayer 952 are first removed by chemical etching 808 to expose underlyingportions of the back side of the semiconductor wafer 912. The method 800then continues with plasma dicing 810 the exposed portions of the backside of the semiconductor wafer 912 to singulate 810 the dies 942, aspictured in view 950, after which the mask 914 is removed 812 from theback sides of the singulated dies 942 having the die streets 922 betweenthem.

Attaching 812 the transport carrier 962 to the back sides of thesingulated dies 942, and then removing 814 the temporary carrier 932from the front sides of the singulated dies 942 occurs as shown in view960 and as described for the method 200 (210, 212) with reference toview 350. After transport, the dies 942 meeting quality controlstandards are separated from the transport carrier 962 and integratedinto die packages in accordance with their designated uses.

In the foregoing specification, specific embodiments have beendescribed. However, one of ordinary skill in the art appreciates thatvarious modifications and changes can be made without departing from thescope of the disclosure as set forth in the claims below. Accordingly,the specification and figures are to be regarded in an illustrativerather than a restrictive sense, and all such modifications are intendedto be included within the scope of present teachings. The benefits,advantages, solutions to problems, and any element(s) that may cause anybenefit, advantage, or solution to occur or become more pronounced arenot to be construed as a critical, required, or essential features orelements of any or all the claims. The invention is defined solely bythe appended claims including any amendment made during the pendency ofthis application and all equivalents of those claims as issued.

Moreover in this document, the terms “comprises,” “comprising,” “has,”“having,” “includes,” “including,” “contains”, “containing” or any othervariation thereof, are intended to cover a non-exclusive inclusion, suchthat a process, method, article, or apparatus that comprises, has,includes, contains a list of elements does not include only thoseelements but may include other elements not expressly listed or inherentto such process, method, article, or apparatus. The terms“substantially,” “essentially,” “approximately”, “about” or any otherversion thereof, are defined as being close to as understood by one ofordinary skill in the art, and in one non-limiting embodiment the termis defined to be within 10%, in another embodiment within 5%, in anotherembodiment within 1% and in another embodiment within 0.5%.

As used herein, the term “configured to,” “configured with,” “arrangedto,” “arranged with,” “capable of” and any like or similar terms meansthat referenced elements have a physical arrangement and/or physicalcoupling and/or connectivity with other elements in an inactive state.This physical arrangement and/or physical coupling and/or connectivitywhile in the inactive state enables the elements to perform statedfunctionality while in the active state. Although the various circuitschematics shown herein depict certain example arrangement of elements,additional intervening elements, devices, features, or components may bepresent in an actual embodiment, assuming that the functionality of thegiven circuit is not adversely affected.

Also, the terms “front,” “back,” “top,” “bottom,” “over,” “under” andthe like in the description and in the claims, if any, are used fordescriptive purposes and not necessarily for describing permanentrelative positions. It is understood that the terms so used areinterchangeable under appropriate circumstances such that theembodiments of the invention described herein are, for example, capableof operation in other orientations than those illustrated or otherwisedescribed herein.

Furthermore, the terms “a” or “an,” as used herein, are defined as oneor more than one. Also, the use of introductory phrases such as “atleast one” and “one or more” in the claims should not be construed toimply that the introduction of another claim element by the indefinitearticles “a” or “an” limits any particular claim containing suchintroduced claim element to inventions containing only one such element,even when the same claim includes the introductory phrases “one or more”or “at least one” and indefinite articles such as “a” or “an.” The sameholds true for the use of definite articles.

In addition, in the foregoing Detailed Description, it can be seen thatvarious features are grouped together in various embodiments for thepurpose of streamlining the disclosure. This method of disclosure is notto be interpreted as reflecting an intention that the claimedembodiments require more features than are expressly recited in eachclaim. Rather, as the following claims reflect, inventive subject matterlies in less than all features of a single disclosed embodiment. Thusthe following claims are hereby incorporated into the DetailedDescription, with each claim standing on its own as a separately claimedsubject matter.

1. A method of wafer dicing, the method comprising: singulating aplurality of dies from a semiconductor wafer, wherein each singulateddie has a back side opposite a front side and adjacent to a lateralside, wherein the back and front sides of the dies correspond toopposing back and front sides of the semiconductor wafer; and depositinga metal outer layer on the back sides of the plurality of singulateddies, wherein a portion of the metal outer layer continues beyond thebacks sides of the singulated dies to deposit at least partially on thelateral sides of the singulated dies.
 2. The method of claim 1, whereinsingulating dies from the semiconductor wafer comprises etching thesemiconductor wafer by plasma dicing.
 3. The method of claim 2, whereinetching the semiconductor wafer comprises etching the back side of thesemiconductor wafer by plasma dicing.
 4. The method of claim 2, whereinetching the semiconductor wafer comprises etching the front side of thesemiconductor wafer by plasma dicing to partially singulate the dies. 5.The method of claim 4, wherein singulating dies from the semiconductorwafer further comprises grinding the back side of the semiconductorwafer to complete singulating the dies.
 6. The method of claim 5 furthercomprising performing a surface preparation on the back sides of thesingulated dies, wherein the surface preparation comprises reactive ionetching the back sides of the singulated dies.
 7. The method of claim 1,wherein depositing the metal outer layer comprises depositing at leastone of: gold; silver; or copper.
 8. The method of claim 1 furthercomprising: attaching the front side of the semiconductor wafer to atemporary carrier before singulating the dies from the semiconductorwafer; attaching the backsides of the singulated dies to a transportcarrier after depositing the metal outer layer on the back sides of thesingulated dies; and removing the front sides of the singulated diesfrom the temporary carrier after attaching the backsides of thesingulated dies to the transport carrier.
 9. The method of claim 1further comprising: mounting the backside of a first die of thesingulated dies to a substrate using a die attach material that bonds tothe metal outer layer deposited on the backside and deposited at leastpartially on the lateral side of the first die.
 10. The method of claim9, wherein using the die attach material comprises using a sinteredmetal, a conductive adhesive, or a solder.
 11. The method of claim 9,wherein the metal outer layer and the die attach material extend beyonda width of the back side of the first die so a back edge of the firstdie, where the back side and the lateral side of the first die meet, isencapsulated by the metal outer layer and the die attach material. 12.The method of claim 1 further comprising setting at least one adjustmentparameter, wherein the adjustment parameter controls the portion of themetal outer layer that continues beyond the backs sides of thesingulated dies to deposit partially on the lateral sides of thesingulated dies.
 13. The method of claim 12, wherein the at least oneadjustment parameter comprises an aspect ratio of a distance between thesingulated dies to a thickness of the singulated dies when depositingthe metal outer layer, wherein the thickness is a distance between thefront and back sides of the singulated dies.
 14. The method of claim 12,wherein the at least one adjustment parameter comprises a front edgecurvature of a front edge of the first die, where the front side and thelateral side of the first die meet.
 15. The method of claim 12, whereinthe at least one adjustment parameter comprises a profile of the lateralside of the singulated dies when depositing the metal outer layer. 16.The method of claim 15, wherein the profile of the lateral sidecomprises one or both of: a lateral slope of the lateral side of thefirst die; or a lateral curvature of the lateral side of the first die.17. (canceled)
 18. (canceled)
 19. (canceled)
 20. (canceled)